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Advanced Semiconductor Fabrication Cleanroom with Equipment
Advanced Semiconductor Fabrication Cleanroom with Equipment
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3 years ago

Semiconductor FAB facility 08

Creado hace 3 years ago · 0 comentarios· 0 Me gusta

Stable Diffusion 2.1 (768)Stable Diffusion 2.1 (768)2x

#semiconductors#fab#facility#clean-room#tech
Semiconductor Fabrication Facility, Fab equipment inside the Clean-room.
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Resumen de Creación por Vincent

Advanced Semiconductor Fabrication Cleanroom with Equipment

This image shows a high-tech semiconductor fabrication facility cleanroom. The photo-realistic scene depicts IC chip manufacturing equipment, illuminated by yellow photolithography lamps. The advanced lab features detailed scientific instruments.

Creado por Mahdi Mahdavi el Mar 27, 2023 usando el modelo generador de imágenes de IA Stable Diffusion 2.1 (768).


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Configuraciones de Creación

Prompts de texto
Semiconductor manufacturing equipment, clean-room, Applied Materials, ASML, Lam Research, Tokyo Electron Limited, KLA Corporation, Advantest, Oxford Instruments
Weight: 1
Semiconductor FAB facility, Fabrication Facility, Cleanroom , IC chip manufacturing ,MOCVD PLD ALD EUV Scanner Stepper machine
Weight: 0.4
a large factory filled with lots of machines, by Tadashi Nakayama, flickr, hospital lighting, on a advanced lab, system unit, square, award-winning, white room, ultra - quality, panasonic
Weight: 0.5
Detailed view of a Photonics FAB LAB clean-room Illuminated by shiny yellow YFT lamps used for Photolithography applications. Photo-Realism. high-resolution. High-tech scientific laboratory equipment present in the background
Weight: 0.4
ugly, tiling, poorly drawn hands, poorly drawn feet, poorly drawn face, out of frame, extra limbs, disfigured, deformed, body out of frame, blurry, bad anatomy, blurred, watermark, grainy, signature, cut off, draft
Weight: -0.3
Modelo
Stable Diffusion 2.1 (768)
CKPT

Stable Diffusion 2.1 (768)

Resolución inicial

Low

Relación de aspecto

1:1

Tiempo de ejecución

Medium

Peso global del Prompt

100%

Peso del Ruido

0%

Método de muestreo

K_EULER


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